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http://arks.princeton.edu/ark:/88435/dsp01g158bh77c
Title: | Mechanisms for Anisotropic Reactive Ion Etching of Photoresist Via O2, CO2, N2/O2, and SO2/O2 Plasmas |
Authors: | Boyce, Craig H. |
Advisors: | Taylor, AT&T Bell Labs Gary N. |
Department: | Chemical and Biological Engineering |
Class Year: | 1994 |
Extent: | 51 Pages |
Other Identifiers: | 5360 |
URI: | http://arks.princeton.edu/ark:/88435/dsp01g158bh77c |
Location : | This thesis can be viewed in person at the Mudd Manuscript Library. To order a copy complete the Senior Thesis Request Form. For more information contact mudd@princeton.edu. |
Type of Material: | Princeton University Senior Theses |
Appears in Collections: | Chemical and Biological Engineering, 1931-2020 |
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